Comparison of temperature-dependent resistivity of heavily Al- and N-codoped 4H-SiC grown by physical vapor transport and heavily Al-doped 4H-SiC grown by chemical vapor deposition

نویسندگان

چکیده

Abstract The temperature-dependent resistivity of heavily Al- and N-codoped 4H-SiC grown by physical vapor transport (PVT) with Al concentrations (C ) higher than 10 19 cm −3 is investigated to obtain high-growth-rate low-cost p + -type substrates suitable for the collectors n-channel insulated-gate bipolar transistors. compared that Al-doped chemical deposition (CVD). In band conduction region, hole mobility PVT-grown codoped samples only slightly lower CVD-grown sample at same C . At values around 2×10 20 , temperature range in variable-range-hopping region much wider samples.

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ژورنال

عنوان ژورنال: Japanese Journal of Applied Physics

سال: 2023

ISSN: ['0021-4922', '1347-4065']

DOI: https://doi.org/10.35848/1347-4065/acfb64